{ "meta": { "api_type": "NWO Projects API", "version": "1.0.2", "licence": { "name": "CC0 1.0 Universal", "url": "https://creativecommons.org/publicdomain/zero/1.0", "description": "To the extent possible under law, all copyright and related or neighbouring rights have been waived worldwide to the data made available through this API." }, "documentation": "https://doi.org/10.5281/zenodo.14918287", "release_date": "2025-08-20T00:00:00", "funder": "https://doi.org/10.13039/501100003246", "ror_id": "https://ror.org/04jsz6e67", "date": "2026-11-05T00:00:00", "count": 1, "per_page": 100, "pages": 1, "page": 1 }, "projects": [ { "project_id": "700.56.027", "title": "Unraveling atomic layer deposition of oxides using multi-quantum and multi-photon vibrational spectroscopies", "funding_scheme_id": 27, "funding_scheme": "ECHO chemie in relatie met fysica/materialen 2006 CW", "department": "Exacte en Natuurwetenschappen", "sub_department": "Chemische Wetenschappen", "start_date": "2008-03-01T00:00:00", "end_date": "2013-02-25T00:00:00", "reporting_year": 2007, "summary_nl": "We propose to elucidate surface-reaction mechanisms and demonstrate the measurement of absolute surface-reaction rate constants on difficult-to-probe atomically smooth oxide surfaces by applying novel optical techniques having sub-monolayer sensitivity. In particular, we will study the layer-by-layer growth of ultra-thin oxide films during atomic layer deposition (ALD). ALD is considered to be crucial for the next-generation of semiconductor devices and has broad application in the fields of nano-science, organic electronics, micro-systems, and photonics. However, the mechanisms of ALD reactions are not well understood. Indeed, more generally, the surface chemistry of oxides is largely unexplored in comparison to metal surfaces due in part to the analytical challenge of oxide surface science. Therefore, we will study the ALD film growth of Al2O3 and HfO2 on SiO2 by two novel vibrational spectroscopic techniques. First, near-infrared evanescent-wave cavity ring down spectroscopy (EW-CRDS) will be employed to probe vibrational overtone and combination modes of surface functional groups, such as OH and CH. These multi-quantum excitations have the potential to reveal unique structural insight by resolving molecular conformations to a greater extend than vibrational fundamentals. Indeed, we recently elucidated the structure of a ?quasi-ice? monolayer on atomically smooth hydroxylated SiO2 by probing surface hydroxyl and adsorbed water species using a 3-quantum transition with sub-monolayer sensitivity, which strongly supports the proposed work. Moreover, a strategy for the measurement of absolute surface coverage by EW-CRDS has been demonstrated, which should enable the determination of absolute surface-reaction rate constants. The second technique is broadband sum frequency generation (BB-SFG), which is a nonlinear surface-specific vibrational spectroscopic technique enabling an entire spectral region associated with a particular functional group to be acquired with a single laser-pulse-pair, yielding high time resolution to probe surface reactions. As EW-CRDS provides absolute spectroscopy of overtones and BB-SFG probes fundamental transitions, we expect these techniques will provide unique complementary insight, especially when applied simultaneously during surface reactions. Moreover, we expect the combination of an absolute linear optical technique, a nonlinear optical technique, and well-controlled atomic layer growth will likely advance our understanding of the surface nonlinear polarizablity and optical response of a monolayer in general. Therefore, the proposed work will broadly contribute to the fundamental surface science of oxides, while advancing the surface optical diagnostics of surfaces and elucidating the mechanistic details of ALD reactions. \n\nWhy this research in our group at the TU/e?: Fundamental studies of chemical reaction mechanisms related to thin film growth have been a key focus area in our group for over 10 years. Atomic layer deposition in particular has been a focus area in our group for the past 3 years, where we now have extensive expertise. Moreover, our group has taken the lead in the application of cavity ring-down spectroscopy (CRDS) and nonlinear spectroscopy in the investigations of vapor-phase based film synthesis. We are well-equipped for the studies proposed. Furthermore, interdisciplinary research inherently leads to greater innovation. \n", "summary_en": "We propose to elucidate surface-reaction mechanisms and demonstrate the measurement of absolute surface-reaction rate constants on difficult-to-probe atomically smooth oxide surfaces by applying novel optical techniques having sub-monolayer sensitivity. In particular, we will study the layer-by-layer growth of ultra-thin oxide films during atomic layer deposition (ALD). ALD is considered to be crucial for the next-generation of semiconductor devices and has broad application in the fields of nano-science, organic electronics, micro-systems, and photonics. However, the mechanisms of ALD reactions are not well understood. Indeed, more generally, the surface chemistry of oxides is largely unexplored in comparison to metal surfaces due in part to the analytical challenge of oxide surface science. Therefore, we will study the ALD film growth of Al2O3 and HfO2 on SiO2 by two novel vibrational spectroscopic techniques. First, near-infrared evanescent-wave cavity ring down spectroscopy (EW-CRDS) will be employed to probe vibrational overtone and combination modes of surface functional groups, such as OH and CH. These multi-quantum excitations have the potential to reveal unique structural insight by resolving molecular conformations to a greater extend than vibrational fundamentals. Indeed, we recently elucidated the structure of a ?quasi-ice? monolayer on atomically smooth hydroxylated SiO2 by probing surface hydroxyl and adsorbed water species using a 3-quantum transition with sub-monolayer sensitivity, which strongly supports the proposed work. Moreover, a strategy for the measurement of absolute surface coverage by EW-CRDS has been demonstrated, which should enable the determination of absolute surface-reaction rate constants. The second technique is broadband sum frequency generation (BB-SFG), which is a nonlinear surface-specific vibrational spectroscopic technique enabling an entire spectral region associated with a particular functional group to be acquired with a single laser-pulse-pair, yielding high time resolution to probe surface reactions. As EW-CRDS provides absolute spectroscopy of overtones and BB-SFG probes fundamental transitions, we expect these techniques will provide unique complementary insight, especially when applied simultaneously during surface reactions. Moreover, we expect the combination of an absolute linear optical technique, a nonlinear optical technique, and well-controlled atomic layer growth will likely advance our understanding of the surface nonlinear polarizablity and optical response of a monolayer in general. Therefore, the proposed work will broadly contribute to the fundamental surface science of oxides, while advancing the surface optical diagnostics of surfaces and elucidating the mechanistic details of ALD reactions. \n\nWhy this research in our group at the TU/e?: Fundamental studies of chemical reaction mechanisms related to thin film growth have been a key focus area in our group for over 10 years. Atomic layer deposition in particular has been a focus area in our group for the past 3 years, where we now have extensive expertise. Moreover, our group has taken the lead in the application of cavity ring-down spectroscopy (CRDS) and nonlinear spectroscopy in the investigations of vapor-phase based film synthesis. We are well-equipped for the studies proposed. Furthermore, interdisciplinary research inherently leads to greater innovation. \n", "project_members": [ { "role": "Researcher", "member_id": 201414, "last_name": "Terlinden", "degree_pre_nominal": "dr. ir.", "initials": "N.M.", "first_name": "Nick", "organisation": "Technische Universiteit Eindhoven - Eindhoven University of Technology||Faculteit Technische Natuurkunde - Department of Applied Physics", "organisation_id": 74838, "ror": "https://ror.org/02c2kyt77", "active": false }, { "role": "Project leader", "member_id": 175945, "last_name": "Sanden", "degree_pre_nominal": "prof. dr. ir.", "initials": "M.C.M.", "first_name": "Richard", "prefix": "van de", "organisation": "Technische Universiteit Eindhoven - Eindhoven University of Technology||Faculteit Technische Natuurkunde - Department of Applied Physics", "organisation_id": 74838, "ror": "https://ror.org/02c2kyt77", "active": false }, { "role": "Main Applicant", "member_id": 175945, "last_name": "Sanden", "degree_pre_nominal": "prof. dr. ir.", "initials": "M.C.M.", "first_name": "Richard", "prefix": "van de", "organisation": "NWO-institutenorganisatie||DIFFER - Dutch Institute for Fundamental Energy Research", "organisation_id": 71825, "ror": "https://ror.org/03w5dn804", "active": true } ], "products": [ { "title": "Influence of the oxidant on the chemical and field-effect passivation of Si by ALD Al2O3", "year": 2011, "edition": "14", "start": 1, "end": 4, "type": "Wetenschappelijk artikel", "journal_title": "Electrochemical and Solid-State Letters", "authors": [ { "last_name": "Pierreux", "initials": "D.", "first_name": "Dieter", "role": "Auteur", "index_number": 0 }, { "last_name": "Kessels", "initials": "W.M.M.", "first_name": "Erwin", "role": "Auteur", "index_number": 0 }, { "last_name": "Dingemans", "initials": "G.", "first_name": "Gijs", "role": "Auteur", "index_number": 0 }, { "last_name": "Profijt", "initials": "H.B.", "first_name": "Harald", "role": "Auteur", "index_number": 0 }, { "last_name": "Terlinden", "initials": "N.M.", "first_name": "Nick", "role": "Auteur", "index_number": 0 }, { "last_name": "Van de Sanden", "initials": "M.C.M.", "first_name": "Richard", "role": "Auteur", "index_number": 0 } ] }, { "title": "Corona charging and optical second-harmonic generation studies of the field-effect passivation of c-Si by Al2O3 films", "year": 2010, "type": "Productbijdrage", "authors": [ { "last_name": "Kessels", "initials": "W.M.M.", "first_name": "Erwin", "role": "Auteur", "index_number": 0 }, { "last_name": "Dingemans", "initials": "G.", "first_name": "Gijs", "role": "Auteur", "index_number": 0 }, { "last_name": "Mandoc", "initials": "M.M.", "first_name": "Magda", "role": "Auteur", "index_number": 0 }, { "last_name": "Adams", "initials": "M.L.C.", "first_name": "Martijn", "role": "Auteur", "index_number": 0 }, { "last_name": "Terlinden", "initials": "N.M.", "first_name": "Nick", "role": "Auteur", "index_number": 0 }, { "last_name": "Van de Sanden", "initials": "M.C.M.", "first_name": "Richard", "role": "Auteur", "index_number": 0 } ] }, { "title": "Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3", "year": 2010, "edition": "96", "start": 112101, "type": "Wetenschappelijk artikel", "journal_title": "Applied Physics Letters", "authors": [ { "last_name": "Kessels", "initials": "W.M.M.", "first_name": "Erwin", "role": "Auteur", "index_number": 0 }, { "last_name": "Dingemans", "initials": "G.", "first_name": "Gijs", "role": "Auteur", "index_number": 0 }, { "last_name": "Terlinden", "initials": "N.M.", "first_name": "Nick", "role": "Auteur", "index_number": 0 }, { "last_name": "Van de Sanden", "initials": "M.C.M.", "first_name": "Richard", "role": "Auteur", "index_number": 0 } ] }, { "title": "Controlling the fixed charge and passivation properties of Si/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition", "year": 2011, "edition": "110", "start": 93715, "type": "Wetenschappelijk artikel", "journal_title": "Journal of Applied Physics", "authors": [ { "last_name": "Kessels", "initials": "W.M.M.", "first_name": "Erwin", "role": "Auteur", "index_number": 6 }, { "last_name": "Dingemans", "initials": "G.", "first_name": "Gijs", "role": "Auteur", "index_number": 1 }, { "last_name": "Verheijen", "initials": "M.A.", "first_name": "Marcel", "role": "Auteur", "index_number": 4 }, { "last_name": "Terlinden", "initials": "N.M.", "first_name": "Nick", "role": "Auteur", "index_number": 2 }, { "last_name": "Van der Sanden", "initials": "M.C.M.", "first_name": "Richard", "role": "Auteur", "index_number": 5 } ] }, { "title": "Second-harmonic generation spectroscopy for interface\nstudies of dielectric thin films on silicon", "year": 2012, "edition": "1", "type": "Proefschrift", "journal_title": "Technische Universiteit Eindhoven", "isbn": "978-90-386-3298-8", "city": "EINDHOVEN", "authors": [ { "last_name": "Terlinden", "initials": "N.M.", "first_name": "Nick", "role": "Auteur", "index_number": 1 } ] }, { "title": "Electric field induced surface passivation of Si by atomic layer deposited Al2O3 studied by optical second-harmonic generation", "year": 2009, "start": 427, "end": 431, "type": "Wetenschappelijk artikel", "journal_title": "34 IEEE Photovoltaic Specialists Conference - 2009", "authors": [ { "last_name": "Sanden", "initials": "M.C.M.", "first_name": "Richard", "prefix": "van de", "role": "Auteur", "index_number": 0 }, { "last_name": "Hoex", "initials": "B.", "role": "Auteur", "index_number": 0 }, { "last_name": "Dingemans", "initials": "G.", "role": "Auteur", "index_number": 0 }, { "last_name": "Gielis", "initials": "J.J.H.", "role": "Auteur", "index_number": 0 }, { "last_name": "Terlinden", "initials": "N.M.", "role": "Auteur", "index_number": 0 }, { "last_name": "Verlaan", "initials": "V.", "role": "Auteur", "index_number": 0 }, { "last_name": "Kessels", "initials": "W.M.M.", "role": "Auteur", "index_number": 0 } ] } ] } ] }